Sintering of nanocrystalline Ta2O5 and ZrO2 films compared to that of TiO2 films
Langue
en
Article de revue
Ce document a été publié dans
Journal of the European Ceramic Society. 2006, vol. vol. 26, n° 6, p. p. 923-932
Elsevier
Résumé en anglais
Thin (d = 60 nm/140 nm) nanocrystalline Ta2O5 and ZrO2 films were deposited onto SiO2 flakes, using a liquid route synthesis. Their sintering behaviour was characterized and compared to that of the corresponding powders ...Lire la suite >
Thin (d = 60 nm/140 nm) nanocrystalline Ta2O5 and ZrO2 films were deposited onto SiO2 flakes, using a liquid route synthesis. Their sintering behaviour was characterized and compared to that of the corresponding powders and the known equivalent TiO2 film in terms of grain size, grain growth and layer porosity. The effect of the substrate was noticeable on crystallisation process but not on grain growth. The sintering behaviour was actually dictated by the initial size and the packing of the precipitated grains related to the synthesis of the film.< Réduire
Mots clés en anglais
Films
Grain growth
Sintering
Ta2O5
ZrO2
TiO2
Origine
Importé de halUnités de recherche