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hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorLINDIC, Marie-Hélène
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorPECQUENARD, Brigitte
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorVINATIER, Philippe
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorLEVASSEUR, Alain
hal.structure.identifierLaboratoire de Chimie théorique et Physico-chimie moléculaire [LCTPCM]
dc.contributor.authorMARTINEZ, Hervé
hal.structure.identifierLaboratoire de Chimie théorique et Physico-chimie moléculaire [LCTPCM]
dc.contributor.authorGONBEAU, Danielle
hal.structure.identifierInstitut des Matériaux Jean Rouxel [IMN]
dc.contributor.authorPETIT, Pierre-Emmanuel
hal.structure.identifierInstitut des Matériaux Jean Rouxel [IMN]
dc.contributor.authorOUVRARD, Guy
dc.date.issued2005
dc.identifier.issn0013-4651
dc.description.abstractEnAmorphous thin films were prepared by radio frequency magnetron sputtering from TiS2 target under pure argon atmosphere. Two complementary techniques, X-ray photoelectron spectroscopy and X-ray absorption spectroscopy, were used to investigate the local and electronic structure of the as-prepared sample and to study the electrochemical mechanisms occurring during the first cycle. The results exhibit that the as-prepared TiO0.6S2.8 thin film is close to bulk TiS3 [which may be viewed as Ti41(S2 2 2)S22] with regard to the local and electronic structure. An electrochemical characterization of the film was performed. Upon lithium insertion, sulfur is first involved in the electrochemical reduction, followed by titanium. The reduction of S2 2 2 to S22 is concomitant with the elongation of the distance between the two sulfur ions of the disulfide pair. At the end of the charge, the electrochemical processes appear to be reversible. This study clearly evidences the major contribution of sulfur atoms beside titanium.
dc.language.isoen
dc.publisherElectrochemical Society
dc.subject.enElectrochemistry
dc.subject.enLithium batteries
dc.subject.enMicrobatteries
dc.subject.enIntercalation compounds
dc.subject.enElectrodes
dc.subject.enThin films
dc.title.enElectrochemical mechanisms during lithium insertion intoTiO0.6S2.8 thin films positive electrode in lithium microbatteries
dc.typeArticle de revue
dc.identifier.doi10.1149/1.1834893
dc.subject.halChimie/Matériaux
bordeaux.journalJournal of The Electrochemical Society
bordeaux.pageA141-A146
bordeaux.volume152
bordeaux.issue1
bordeaux.peerReviewedoui
hal.identifierhal-00021162
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00021162v1
bordeaux.COinSctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Journal%20of%20The%20Electrochemical%20Society&rft.date=2005&rft.volume=152&rft.issue=1&rft.spage=A141-A146&rft.epage=A141-A146&rft.eissn=0013-4651&rft.issn=0013-4651&rft.au=LINDIC,%20Marie-H%C3%A9l%C3%A8ne&PECQUENARD,%20Brigitte&VINATIER,%20Philippe&LEVASSEUR,%20Alain&MARTINEZ,%20Herv%C3%A9&rft.genre=article


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