Evidence of diffusion at BaTiO3/silicon interfaces
| hal.structure.identifier | Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB] | |
| dc.contributor.author | CHUNG SEU, U-Chan | |
| hal.structure.identifier | Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB] | |
| dc.contributor.author | MICHAU, Dominique | |
| hal.structure.identifier | Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB] | |
| dc.contributor.author | ELISSALDE, Catherine | |
| hal.structure.identifier | Institute of Materials Science, Surface Science Division | |
| dc.contributor.author | LI, Shunyi | |
| hal.structure.identifier | Institute of Materials Science, Surface Science Division | |
| dc.contributor.author | KLEIN, Andreas | |
| hal.structure.identifier | Institut de Chimie de la Matière Condensée de Bordeaux [ICMCB] | |
| dc.contributor.author | MAGLIONE, Mario | |
| dc.date.issued | 2012 | |
| dc.identifier.issn | 0040-6090 | |
| dc.description.abstractEn | Interdiffusion at interfaces between several materials in integrated structures is becoming more and more challenging. We performed a deep study of diffusion in BaTiO3/Si films using X-Ray Diffraction analysis, Rutherford Backscattering Spectrometry and X-ray Photoelectron Spectroscopy at intermediate annealing stages. We show that controlling local chemistry through inter-diffusion phenomena at interfaces is possible thanks to the structural and chemical matching between BaTiO3 and fresnoite. BaTiO3/Si stacks can serve as a model system to investigate the interphase generation at interfaces. | |
| dc.language.iso | en | |
| dc.publisher | Elsevier | |
| dc.subject.en | Barium titanate | |
| dc.subject.en | Interface | |
| dc.subject.en | Rutherford Backscattering Spectrometry (RBS) | |
| dc.subject.en | Thin films | |
| dc.subject.en | Diffusion | |
| dc.subject.en | X-ray photoelectron spectroscopy (XPS) | |
| dc.subject.en | Interphase growth | |
| dc.title.en | Evidence of diffusion at BaTiO3/silicon interfaces | |
| dc.type | Article de revue | |
| dc.identifier.doi | 10.1016/j.tsf.2011.09.055 | |
| dc.subject.hal | Chimie/Matériaux | |
| bordeaux.journal | Thin Solid Films | |
| bordeaux.page | 1997-2000 | |
| bordeaux.volume | 520 | |
| bordeaux.issue | 6 | |
| bordeaux.peerReviewed | oui | |
| hal.identifier | hal-00663012 | |
| hal.version | 1 | |
| hal.popular | non | |
| hal.audience | Internationale | |
| hal.origin.link | https://hal.archives-ouvertes.fr//hal-00663012v1 | |
| bordeaux.COinS | ctx_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.jtitle=Thin%20Solid%20Films&rft.date=2012&rft.volume=520&rft.issue=6&rft.spage=1997-2000&rft.epage=1997-2000&rft.eissn=0040-6090&rft.issn=0040-6090&rft.au=CHUNG%20SEU,%20U-Chan&MICHAU,%20Dominique&ELISSALDE,%20Catherine&LI,%20Shunyi&KLEIN,%20Andreas&rft.genre=article |
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