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Modification of the surface of nanodisperse amorphous silica prepared by fluoride technology

hal.structure.identifierInstitute of Geology and Nature Management
dc.contributor.authorDEMYANOVA, Larisa P.
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorTRESSAUD, Alain
dc.date.issued2012
dc.description.abstractEnThe physicochemical properties of amorphous silica prepared by the fluoride technology are studied; the surface of silica is modified by direct fluorination with F2 gas or cC4F8 radio frequency plasma. The modification of the surface physical chemical properties after fluorination are compared with the initial silica and analyzed by X-ray photoelectron spectroscopy, IR spectroscopy, and transmission electron microscopy.
dc.language.isoen
dc.subject.enSilica
dc.subject.enAmorphous materials
dc.subject.enFluoride
dc.subject.enSpectroscopy
dc.title.enModification of the surface of nanodisperse amorphous silica prepared by fluoride technology
dc.typeArticle de revue
dc.identifier.doi10.1134/S2070205112020062
dc.subject.halChimie/Matériaux
bordeaux.journalProtection of Metals and Physical Chemistry of Surfaces
bordeaux.page211-216
bordeaux.volume48
bordeaux.issue2
bordeaux.peerReviewedoui
hal.identifierhal-00680383
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00680383v1
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