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hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorPECQUENARD, Brigitte
hal.structure.identifierLaboratoire d'Innovation pour les Technologies des Energies Nouvelles et les nanomatériaux [LITEN]
dc.contributor.authorLE CRAS, Frédéric
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
hal.structure.identifierLaboratoire d'Innovation pour les Technologies des Energies Nouvelles et les nanomatériaux [LITEN]
dc.contributor.authorPOINOT, Delphine
hal.structure.identifierLaboratoire d'Innovation pour les Technologies des Energies Nouvelles et les nanomatériaux [LITEN]
dc.contributor.authorSICARDY, Olivier
hal.structure.identifierInstitut de Chimie de la Matière Condensée de Bordeaux [ICMCB]
dc.contributor.authorMANAUD, Jean-Pierre
dc.date.issued2014-03-12
dc.identifier.issn1944-8244
dc.description.abstractEnCuO thin films were prepared by radio frequency magnetron sputtering using a copper target in a (Ar + O2) reactive mixture. Different sputtering parameters were varied including oxygen flow rate, total pressure, target-substrate distance, substrate temperature and target orientation. As expected, the thin film chemical composition is strongly dependent on the oxygen flow rate. CuO thin films having a good electronic conductivity (9.3 × 10(-1) S*cm(-1)) were obtained with an oxygen concentration of 12%. The texture and the columnar growth are amplified when the target is tilted. Preliminary electrochemical results highlight that CuO thin film performances in lithium systems are tightly related to their morphology and structure.
dc.language.isoen
dc.publisherWashington, D.C. : American Chemical Society
dc.title.enThorough Characterization of Sputtered CuO Thin Films Used as Conversion Material Electrodes for Lithium Batteries.
dc.typeArticle de revue
dc.identifier.doi10.1021/am4055386
dc.subject.halChimie/Matériaux
bordeaux.journalACS Applied Materials & Interfaces
bordeaux.page3413-3420
bordeaux.volume6
bordeaux.issue5
bordeaux.peerReviewedoui
hal.identifierhal-00960000
hal.version1
hal.popularnon
hal.audienceInternationale
hal.origin.linkhttps://hal.archives-ouvertes.fr//hal-00960000v1
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