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dc.rights.licenseopenen_US
dc.relation.isnodouble90866c14-1e4b-4d1f-877c-c662d97b91be*
hal.structure.identifierLaboratoire des Composites Thermostructuraux [LCTS]
dc.contributor.authorCARMINATI, P.
hal.structure.identifierInstitut des Sciences Moléculaires [ISM]
dc.contributor.authorBUFFETEAU, Thierry
hal.structure.identifierInstitut des Sciences Moléculaires [ISM]
dc.contributor.authorDAUGEY, N.
hal.structure.identifierLaboratoire des Composites Thermostructuraux [LCTS]
dc.contributor.authorCHOLLON, Georges
hal.structure.identifierLaboratoire des Composites Thermostructuraux [LCTS]
dc.contributor.authorREBILLAT, Francis
hal.structure.identifierLaboratoire des Composites Thermostructuraux [LCTS]
dc.contributor.authorJACQUES, Sylvain
dc.date.accessioned2021-07-21T07:59:42Z
dc.date.available2021-07-21T07:59:42Z
dc.date.issued2018-10-01
dc.identifier.issn0040-6090en_US
dc.identifier.urioai:crossref.org:10.1016/j.tsf.2018.08.020
dc.identifier.urihttps://oskar-bordeaux.fr/handle/20.500.12278/110135
dc.description.abstractEnThe structural and morphological characteristics of flat BN coatings processed by chemical vapour deposition, using BCl3−NH3−H2 gas mixtures at low pressure (P < 1 kPa), have been investigated as a function of the deposition temperature (ranging from 900 °C to 1400 °C) and the total gas flow rate. The resulting BN coatings are mainly turbostratic but with heterogeneous microstructures, i.e. mixtures of poorly and highly organized domains. The structural homogeneity and the degree of crystallization depend notably on the nature of the dilution gas (either H2 or Ar) and the depletion of gas species. The decrease of the apparent activation energy from 80 kJ.mol-1 below 1200 °C to 40 kJ.mol-1 above 1200 °C reflects a change in the deposition regime. Ex situ Fourier transform infrared analysis of the residual gas mixture allowed intermediate species leading to poorly or highly organized BN to be tracked and then connected with the main reaction paths leading to the different BN coatings
dc.language.isoENen_US
dc.rightsAttribution 3.0 United States*
dc.rights.urihttp://creativecommons.org/licenses/by/3.0/us/*
dc.sourcecrossref
dc.subject.enBoron nitride
dc.subject.enBoron trichloride
dc.subject.enAminodichloroborane
dc.subject.enDichloroborane
dc.subject.enEffective precursor
dc.subject.enCrystallization degree
dc.subject.enStructural homogeneity
dc.subject.enFourier-transform infrared spectroscopy
dc.title.enLow pressure chemical vapour deposition of BN: Relationship between gas phase chemistry and coating microstructure
dc.typeArticle de revueen_US
dc.identifier.doi10.1016/j.tsf.2018.08.020en_US
dc.subject.halChimie/Matériauxen_US
bordeaux.journalThin Solid Filmsen_US
bordeaux.page106-114en_US
bordeaux.volume664en_US
bordeaux.hal.laboratoriesLaboratoire des Composites Thermo Structuraux (LCTS) - UMR 5801en_US
bordeaux.institutionUniversité de Bordeauxen_US
bordeaux.institutionCNRSen_US
bordeaux.institutionCEAen_US
bordeaux.peerReviewedouien_US
bordeaux.inpressnonen_US
bordeaux.import.sourcedissemin
hal.identifierhal-02971856
hal.exportfalse
workflow.import.sourcedissemin
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